马弗炉,实验电炉,试验电炉,气氛炉,箱式电炉,管式电炉,烧结炉,熔块炉,立式电炉,卧式电炉,真空炉,节能电炉,升降炉,梭式炉,熔块炉
作者：
中国实验电炉网
来源：
中国实验电炉网
发布日期：
2009-04-24 19:13:44.0
VF1200X is a vacuum chamber furnace with 8" diameter x 7" height vertical quartz liner and stainless steel vacuum flange. It is designed for calcining or sintering ceramic material or annealing semiconductor wafer under vacuum or various gas atmosphere up to 1200oC.
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Features:
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High quality Ni-Cr-Al resistance wire as heating element and can be heated up to 1200oC
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High purity quartz liner : 8" O.D. x 7.5" I.D x 13.2" Height ( 205 OD x 190 ID x 340 H mm )
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Stainless steel vacuum flange with one two ball valves and vacuum gauge is included for immediate use.
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Built in precision digital temperature controller is 30 segments programmable to control heating rate, cooling rate and dwell time
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All accessories are included for immediate use
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Specifications:
- Working Temp: 100 - 1200 oC ( 1100oC Max. Continuous and 1200oC Max. < 1 hours )
- Refractory Chamber size : 240 dia. x 220 H (9.5"Dia. x 8.6"H)
- Quart Liner size: 205 mm O.D x 190 mm I.D x 340 mm Height
- Vacuum flange: Stainless steel with double high temperature silicone O-ring ( up to 300oC )
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Vacuum pressure: Depended on vacuum pump limit.
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Vacuum pump is not included, please order vacuum pump separately ( click underlined to choose )
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For high vacuum, please choose precision digital vacuum gauge ( click underlined to order separately )
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Gas flow and pressure: Inert gas and oxygen gas flow can be achieved via two valves.
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Max. gas pressure shall be less than 1.2 atm
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You may choose flow meter to monitor flow rate ( click under lined to order separately)
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If use hydrogen gas, the furnace must be placed under fume hood or safe place
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Temperature controller: 30 segments programmable with accuracy +/-1.0 oC with bright LED digital control panel
- Uniformity: +/- 2 oC
- Power: Single phase 240 VAC / 50/60Hz , 3000 W max. ( 20 A breaker required )
- Overall Dimension: 510 x 435 x 425 mm
- Net Weight: 35 Kg
- Shipping weight: 120 lbs
- Shipping volume: 45x28x35"
Applications:
- Calcine high purity compound under vacuum or inert gas
- Anneal or diffusion semiconductor wafer up to 6 " diameter
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